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Nova Measuring Instruments To Present To Investors At The Roth Capital Growth Stock Conference On Monday, March 15, 2010
3/8/2010
Measuring Instruments Ltd. (Nasdaq:
NVMI), a provider of leading edge stand alone metrology and a market leader of integrated metrology solutions to the semiconductor process control market, announced that it will be presenting to investors at the 22nd Annual Roth Capital Growth Stock Conference, which will be held at the Ritz Carlton Laguna Niguel in Dana Point, California on Monday, March 15, 2010
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Wenzel Introduces New Grind Burn Gear Surface Quality Control And Testing Capability For Geartec Gear Measuring Machines And Wenzel LH Gear Measuring Machines
3/8/2010
In a continuing effort to enhance the capabilities of Wenzel gear measuring equipment, Wenzel has introduced a new feature that detects any presence of grind burn or pits on gears that are being measured on any Wenzel GearTec gear measurement machine
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FEI Completes Multiple System Installation At New Materials Ageing Institute Research Center In France
3/8/2010
FEI Company (Nasdaq:FEIC), a leading diversified scientific instruments company providing electron and ion-beam microscopes and tools for nanoscale applications across many industries, announces the completion of a multiple system installation at the Materials Ageing Institute (MAI) in France, a utility-oriented research center financed by Electricité de France (EDF), the Tokyo Electric Power Company (TEPCO), the Kansai Electric Power Company (KEPCO) and the US Electric Power Research Institute
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QED Technologies Announces Implementation Of Its ASI Metrology System For Aspheres By Leibniz Institute For Surface Modification
3/4/2010
QED Technologies, the pioneer and exclusive provider of Magnetorheological Finishing (MRF) and Subaperture Stitching Interferometry (SSI), announces implementation of one of its new Aspheric Stitching Interferometers (ASI) at the Leibniz Institute for Surface Modification (IOM) in Leipzig, Germany
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QED Technologies Announces Implementation Of Its ASI® Metrology System For Aspheres By Leibniz Institute For Surface Modification
3/4/2010
QED Technologies, the pioneer and exclusive provider of Magnetorheological Finishing (MRF) and Subaperture Stitching Interferometry (SSI), announces implementation of one of its new Aspheric Stitching Interferometers (ASI) at the Leibniz Institute for Surface Modification (IOM) in Leipzig, Germany
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Wulftec Introduces The SMHPA-200 Portable Automatic Turntable Stretch Wrapper
3/1/2010
Leading North American manufacturer Wulftec / M.J. Maillis has just launched the new SMHPA-200 High Profile Portable Automatic Turntable Stretch Wrapper.
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Roundtest RA-220 – Roundness And Cylindricity In One Compact System
3/1/2010
The new Roundtest RA-220 roundness measuring machine from Mitutoyo America Corporation offers measurement versatility with a compact footprint. The Roundtest RA-220 analysis options include: roundness, cylindricity, coaxiality, concentricity, radial runout, axial runout, squareness to axis and plane, wall thickness deviation, flatness and parallelism.
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One-Stop-Shop For Innovative Weighing And Measuring Solutions!
2/24/2010
From research and development to storage and despatch, METTLER TOLEDO supplies weighing and analytical equipment to suit all budgets and applications. Innovative solutions improve production, simplify processes and maximise profits.
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Vishay's New Z203 Metrology And Laboratory Ultra-High-Precision Resistors Feature Maximum TCR Of 0.5 ppm/°C, Load-Life Stability Of 0.005 % (50 ppm) At + 70 °C For 10,000 Hours, And Tolerance To 0.005 % (50 ppm)
2/22/2010
Vishay Intertechnology, Inc. recently announced a new series of metrology and laboratory ultra-high-precision Bulk Metal Z-Foil resistors built using Z1-Foil technology that features new orders of accuracy, stability, and fast thermal stabilization in sizes small enough for permanent assembly in operational equipment
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NanoInk Installs New Nanofabrication System At The University Of Strathclyde’s Centre For Molecular Nanometrology
2/17/2010
Professor Duncan Graham and his research group at The Centre for Molecular Nanometrology at the University of Strathclyde has taken delivery of the DPN 5000 nanolithography tool, NanoInk's latest high precision Dip Pen Nanolithography (DPN) system